新聞資訊-深圳市同泰化學技術有限公司 電鍍中間體/水性樹脂與助劑/特種水性油墨/水性納米二氧化矽/工業清洗/半導體化學品
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新材(cái)料科技(ji)與化學(xue)技術創(chuang)新
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Copper Gleam™ HS-200 Electrolytic Copper from Dupont Dow Rhom Hass Company

The Copper Gleam™ HS-200 bath is a full bright acid copper plating process specifically formulated for use in conveyorized plating equipment with insoluble anode. Formulated for high current density plating, the process is capable of producing uniform, bright deposits of high ductility and tensile strength in accelerated plating times.

發布(bù)時間:

2025-12-13

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Circuposit™ 3000-1 from Dupont Dow Rhom Hass Company

Circuposit™ 3000-1 Electroless Copper is a unique, patented process that is widely used by leading PCB fabricators throughout the world. This novel self-accelerating electroless copper eliminates the need for a separate accelerator step, saving space and improving quality and control. The 3350-1 electroless copper bath is formulated to provide improved physical properties and produce exceptionally fine-grain, low-stress deposits, which yield enhanced hole-wall coverage and excellent adhesion even on the most demanding high-performance substrates.

發布(bù)時間:

2025-12-13

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